Physical Vapour Deposition (PVD) is a widely used technique for depositing thin metallic, ceramic, or compound films onto substrates for applications ranging from electronics to hard coatings and decorative finishes. When combined with a glovebox, PVD becomes an even more powerful tool, allowing deposition of highly reactive materials in a completely controlled atmosphere without any risk of oxidation or contamination. PhotonExport offers integrated PVD and glovebox solutions designed for both research and small-scale production environments.
Our PVD-glovebox systems can accommodate sputtering, thermal evaporation, and e-beam evaporation sources, and are compatible with substrate heating, rotation, and in-situ monitoring capabilities. The glovebox connection allows samples to be loaded, processed, and transferred to further analysis or encapsulation steps entirely under inert conditions. This is particularly valuable for perovskite devices, organic electronics, and battery electrode research, where even brief exposure to air can have a significant impact on results.
